Fabrication of Micro- and Nanoscale Polymer Structures by Soft Lithography and Spin Dewetting

In this work, the process of spin dewetting of a polymer solution on a topographically patterned PDMS mold was used for fabrication of microand nanaoscale polymer structures. Spin coating was used to provide a fast and reproducible coating. This simple technique was capable of producing a wide range of polymer feature geometries from a single microfabricated mold. This experimental study looks at the effects of the original mold feature geometry as well as the polymer solution concentration on the resultant microstructures. Polystyrene and poly(propyl methacrylate) were used as model polymers. Features with film thickness ranging from<100 nm to>5 mmwere obtained using this technique. The process was also extended to fabrication of nanoscale features.